Band offsets for ultrathin SiO2 and Si3N4 films on Si(111) and Si(100) from photoemission spectroscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 4, 1999, Pages 1831-1835

  Keister, J W ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

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[No Author keywords available]

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EID: 22644448699     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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