Interfaces and defects of high-K oxides on silicon

Solid-State Electronics

Volumn 49, Issue 3, 2005, Pages 283-293

  Robertson, J ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Defects; Electronic properties; High K oxide; Interface

Indexed keywords

ALUMINA; BONDING; DEFECTS; DEPOSITION; ELECTRONIC PROPERTIES; INTERFACES (MATERIALS); NUCLEATION; PARAMAGNETIC RESONANCE; PERMITTIVITY; SILICON; ZIRCONIA;

ATOMIC CONFIGURATIONS; BAND OFFSETS; GATE OXIDES; HIGH-K OXIDES;

SILICA;

EID: 12344337788     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2004.11.011     Document Type: Review

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