Reaction-diffusion in high-k dielectrics on Si

Surface Science Reports

Volumn 49, Issue 1-3, 2003, Pages 1-114

  De Almeida, R M C ^a   Baumvol, I J R ^a  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; DEPOSITION; ELECTRON TUNNELING; LEAKAGE CURRENTS; MICROELECTRONICS; PERMITTIVITY; SILICON; SINGLE CRYSTALS; SUBSTRATES; ULTRATHIN FILMS;

GATE DIELECTRIC;

DIELECTRIC MATERIALS;

EID: 0037322229     PISSN: 01675729     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-5729(02)00113-9     Document Type: Review

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