Interfacial oxide formation and oxygen diffusion in rare earth oxide-silicon epitaxial heterostructures

Applied Physics Letters

Volumn 81, Issue 22, 2002, Pages 4183-4185

  Narayanan, V ^a   Guha, S ^a   Copel, M ^a   Bojarczuk, N A ^a   Flaitz, P L ^b   Gribelyuk, M ^b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; DIFFUSION; EPITAXIAL GROWTH; OXYGEN; PERMITTIVITY; SILICON;

INTERFACIAL OXIDE FORMATION;

HETEROJUNCTIONS;

EID: 0037175936     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1524692     Document Type: Article

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