Hafnium and zirconium silicates for advanced gate dielectrics

Journal of Applied Physics

Volumn 87, Issue 1, 2000, Pages 484-492

  Wilk, G D ^a,d   Wallace, R M ^b,d   Anthony, J M ^c,d  

^a LUCENT TECHNOLOGIES   (United States)

^b UNIVERSITY OF NORTH TEXAS   (United States)

^c UNIVERSITY OF SOUTH FLORIDA   (United States)

^d TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346534582     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371888     Document Type: Article

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