Metal-dielectric band alignment and its implications for metal gate complementary metal-oxide-semiconductor technology

Journal of Applied Physics

Volumn 92, Issue 12, 2002, Pages 7266-7271

  Yeo, Yee Chia ^a   King, Tsu Jae ^a   Hu, Chenming ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE TRANSFER; DIELECTRIC MATERIALS; FERMI LEVEL; MOSFET DEVICES; PARAMETER ESTIMATION; POLYSILICON; SILICA;

GATE TUNNELING LEAKAGE CURRENT;

GATES (TRANSISTOR);

EID: 0037115703     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1521517     Document Type: Article

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