Status and trends in Ge CMOS technology

ECS Transactions

Volumn 54, Issue 1, 2013, Pages 25-37

  Claeys, C ^a,b   Mitard, J ^a   Hellings, G ^a   Eneman, G ^a,c   De Jaeger, B ^a   Witters, L ^a   Loo, R ^a   Delabie, A ^a   Sioncke, S ^a   Caymax, M ^a   Simoen, E ^a  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c RESEARCH FOUNDATION FLANDERS FWO   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS TECHNOLOGY; DEEP-SUBMICRON CMOS TECHNOLOGY; GE MOSFETS; GE PROCESSING; N-CHANNEL; P CHANNELS; PERFORMANCE DATA; TECHNOLOGICAL ASPECTS;

CMOS INTEGRATED CIRCUITS; MOSFET DEVICES; SEMICONDUCTOR DEVICE MANUFACTURE; THIN FILM TRANSISTORS; THIN FILMS;

GERMANIUM;

EID: 84885640198     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/05401.0025ecst     Document Type: Conference Paper

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