Application of group electronegativity concepts to the effective work functions of metal gate electrodes on high-κ gate oxides

Microelectronic Engineering

Volumn 84, Issue 9-10, 2007, Pages 2196-2200

  Schaeffer, J K ^a   Gilmer, D C ^a   Capasso, C ^a   Kalpat, S ^a   Taylor, B ^a   Raymond, M V ^a   Triyoso, D ^a   Hegde, R ^a   Samavedam, S B ^a   White Jr , B E ^a  

^a FREESCALE SEMICONDUCTOR INC   (United States)

Author keywords

Effective work function; Electronegativity; Hafnium dioxide; Metal gate electrode

Indexed keywords

DIELECTRIC MATERIALS; ELECTRIC CHARGE; ELECTRODES; ELECTRONEGATIVITY; HAFNIUM COMPOUNDS; STOICHIOMETRY;

EFFECTIVE WORK FUNCTIONS; HAFNIUM DIOXIDE; METAL GATE ELECTRODES; METAL GATES;

GATE DIELECTRICS;

EID: 34248655163     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.04.130     Document Type: Article

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