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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 2, 2004, Pages 791-800

Thermodynamic considerations in the stability of binary oxides for alternative gate dielectrics in complementary metal-oxide-semiconductors

(1) Stemmer, Susanne a

a University of California (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DESORPTION; DIELECTRIC MATERIALS; DIFFUSION; GATES (TRANSISTOR); INTERFACES (MATERIALS); NANOSTRUCTURED MATERIALS; PARTIAL PRESSURE; REACTION KINETICS; SILICA; SILICON; STOICHIOMETRY; THERMODYNAMIC STABILITY; THIN FILMS;

GATE DIELECTRICS; INTERFACIAL GROWTH; REACTION PATHWAYS; VACANCY FORMATION;

CMOS INTEGRATED CIRCUITS;

EID: 2342632548 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1688357 Document Type: Article

Times cited : (101)

References (64)

1
- 0030291621
- K. J. Hubbard and D. G. Schlom, J. Mater. Res. 11, 2757 (1996).
- (1996) J. Mater. Res. , vol.11 , pp. 2757
- Hubbard, K.J.¹ Schlom, D.G.²

2
- 84861420043
- to be published
- D. G. Schlom, C. A. Billmann, J. H. Haeni, J. Lettieri, P. H. Tan, R. R. M. Held, S. Völk, and K. J. Hubbard, Appl. Phys. A: Mater. Sci. Process, (to be published).
- Appl. Phys. A: Mater. Sci. Process
- Schlom, D.G.¹ Billmann, C.A.² Haeni, J.H.³ Lettieri, J.⁴ Tan, P.H.⁵ Held, R.R.M.⁶ Völk, S.⁷ Hubbard, K.J.⁸

3
- 0034227861
- Y.-M, Sun, J. Lozano, H. Ho, H. J. Park, S. Veldman, and J. M. White, Appl. Surf. Sci. 161, 115 (2000).
- (2000) Appl. Surf. Sci. , vol.161 , pp. 115
- Sun, Y.-M.¹ Lozano, J.² Ho, H.³ Park, H.J.⁴ Veldman, S.⁵ White, J.M.⁶

4
- 0001459359
- T. S. Jeon, J. M. White, and D. L. Kwong, Appl. Phys. Lett. 78, 368 (2001).
- (2001) Appl. Phys. Lett. , vol.78 , pp. 368
- Jeon, T.S.¹ White, J.M.² Kwong, D.L.³

5
- 0035477585
- J. P. Maria, D. Wicaksana, A. I. Kingon, B. Busch, H. Schulte, E. Garfunkel, and T. Gustafsson, J. Appl. Phys. 90, 3476 (2001).
- (2001) J. Appl. Phys. , vol.90 , pp. 3476
- Maria, J.P.¹ Wicaksana, D.² Kingon, A.I.³ Busch, B.⁴ Schulte, H.⁵ Garfunkel, E.⁶ Gustafsson, T.⁷

6
- 0036678139
- M. A. Gribelyuk, A. Callegari, E. P. Gusev, M. Copel, and D. A. Buchanan, J. Appl. Phys. 92, 1232 (2002).
- (2002) J. Appl. Phys. , vol.92 , pp. 1232
- Gribelyuk, M.A.¹ Callegari, A.² Gusev, E.P.³ Copel, M.⁴ Buchanan, D.A.⁵

7
- 0042267289
- S. Sayan, E. Garfunkel, T. Nishimura, W. H. Schulte, T. Gustafsson, and G. D. Wilk, J. Appl. Phys. 94, 928 (2003).
- (2003) J. Appl. Phys. , vol.94 , pp. 928
- Sayan, S.¹ Garfunkel, E.² Nishimura, T.³ Schulte, W.H.⁴ Gustafsson, T.⁵ Wilk, G.D.⁶

8
- 79956005998
- C. M. Perkins, B. B. Triplett, P. C. McIntyre, K. C. Saraswat, and E. Shero, Appl. Phys. Lett. 81, 1417 (2002).
- (2002) Appl. Phys. Lett. , vol.81 , pp. 1417
- Perkins, C.M.¹ Triplett, B.B.² McIntyre, P.C.³ Saraswat, K.C.⁴ Shero, E.⁵

9
- 79955986464
- M. Gutowski, J. E. Jaffe, C.-L. Liu, M. Stoker, R. I. Hedge, R. S. Rai, and P. J. Tobin, Appl. Phys. Lett. 80, 1897 (2002).
- (2002) Appl. Phys. Lett. , vol.80 , pp. 1897
- Gutowski, M.¹ Jaffe, J.E.² Liu, C.-L.³ Stoker, M.⁴ Hedge, R.I.⁵ Rai, R.S.⁶ Tobin, P.J.⁷

10
- 0036640491
- S. Stemmer, Z. Chen, R. Keding, J.-P. Maria, D. Wicaksana, and A. I. Kingon, J. Appl. Phys. 92, 82 (2002).
- (2002) J. Appl. Phys. , vol.92 , pp. 82
- Stemmer, S.¹ Chen, Z.² Keding, R.³ Maria, J.-P.⁴ Wicaksana, D.⁵ Kingon, A.I.⁶

11
- 79956048481
- S. Stemmer, D. O. Klenov, Z. Q. Chen, D. Niu, R. W. Ashcraft, and G. N. Parsons, Appl. Phys. Lett. 81, 712 (2002).
- (2002) Appl. Phys. Lett. , vol.81 , pp. 712
- Stemmer, S.¹ Klenov, D.O.² Chen, Z.Q.³ Niu, D.⁴ Ashcraft, R.W.⁵ Parsons, G.N.⁶

12
- 0037175909
- M. Copel, E. Cartier, V. Narayanan, M. C. Reuter, S. Guha, and N. Bojarczuk, Appl. Phys. Lett. 81, 4227 (2002).
- (2002) Appl. Phys. Lett. , vol.81 , pp. 4227
- Copel, M.¹ Cartier, E.² Narayanan, V.³ Reuter, M.C.⁴ Guha, S.⁵ Bojarczuk, N.⁶

13
- 33845456830
- G. A. Botton, J. A. Gupta, D. Landheer, J. P. McCaffrey, G. I. Sproule, and M. J. Graham, J. Appl. Phys. 91, 2921 (2002).
- (2002) J. Appl. Phys. , vol.91 , pp. 2921
- Botton, G.A.¹ Gupta, J.A.² Landheer, D.³ McCaffrey, J.P.⁴ Sproule, G.I.⁵ Graham, M.J.⁶

14
- 0035828615
- B. W. Busch, J. Kwo, M. Hong, J. P. Mannaerts, B. J. Sapjeta, W. H. Schulte, E. Garfunkel, and T. Gustafsson, Appl. Phys. Lett. 79, 2447 (2001).
- (2001) Appl. Phys. Lett. , vol.79 , pp. 2447
- Busch, B.W.¹ Kwo, J.² Hong, M.³ Mannaerts, J.P.⁴ Sapjeta, B.J.⁵ Schulte, W.H.⁶ Garfunkel, E.⁷ Gustafsson, T.⁸

15
- 0000020022
- M. Copel, M. Gribelyuk, and E. Gusev, Appl. Phys. Lett. 76, 436 (2000).
- (2000) Appl. Phys. Lett. , vol.76 , pp. 436
- Copel, M.¹ Gribelyuk, M.² Gusev, E.³

16
- 0034668553
- B. W. Busch, W. H. Schulte, E. Garfunkel, T. Gustafsson, W. Qi, R. Nieh, and J. Lee, Phys. Rev. B 62, R13290 (2000).
- (2000) Phys. Rev. B , vol.62
- Busch, B.W.¹ Schulte, W.H.² Garfunkel, E.³ Gustafsson, T.⁴ Qi, W.⁵ Nieh, R.⁶ Lee, J.⁷

17
- 0035803330
- J. P. Chang and Y.-S. Lin, Appl. Phys. Lett. 79, 3824 (2001).
- (2001) Appl. Phys. Lett. , vol.79 , pp. 3824
- Chang, J.P.¹ Lin, Y.-S.²

18
- 79955989385
- K. Muraoka, Appl. Phys. Lett. 80, 4516 (2002).
- (2002) Appl. Phys. Lett. , vol.80 , pp. 4516
- Muraoka, K.¹

19
- 0003477976
- VCH, Weinheim
- I. Barin, Thermochemical Data of Pure Substances, Vols. I and II, 3rd ed. (VCH, Weinheim, 1995).
- (1995) Thermochemical Data of Pure Substances, Vols. I and II, 3rd Ed. , vol.1-2
- Barin, I.¹

20
- 36849120091
- J. J. Lander and J. Morrison, J. Appl. Phys. 33, 2089 (1962).
- (1962) J. Appl. Phys. , vol.33 , pp. 2089
- Lander, J.J.¹ Morrison, J.²

21
- 0020140027
- F. W. Smith and G. Ghidini, J. Electrochem. Soc. 129, 1300 (1982).
- (1982) J. Electrochem. Soc. , vol.129 , pp. 1300
- Smith, F.W.¹ Ghidini, G.²

22
- 0033424187
- D. Starodub, E. P. Gusev, E. Garfunkel, and T. Gustafsson, Surf. Rev. Lett. 6, 45 (1999).
- (1999) Surf. Rev. Lett. , vol.6 , pp. 45
- Starodub, D.¹ Gusev, E.P.² Garfunkel, E.³ Gustafsson, T.⁴

23
- 0000969098
- U. Brossmann, R. Würschum, U. Södervall, and H.-E. Schneider, J. Appl. Phys. 85, 7646 (1999).
- (1999) J. Appl. Phys. , vol.85 , pp. 7646
- Brossmann, U.¹ Würschum, R.² Södervall, U.³ Schneider, H.-E.⁴

24
- 0035896875
- C. M. Perkins, B. B. Triplett, P. C. McIntyre, K. C. Saraswat, S. Haukka, and M. Tuominen, Appl. Phys. Lett. 78, 2357 (2001).
- (2001) Appl. Phys. Lett. , vol.78 , pp. 2357
- Perkins, C.M.¹ Triplett, B.B.² McIntyre, P.C.³ Saraswat, K.C.⁴ Haukka, S.⁵ Tuominen, M.⁶

25
- 79955992826
- T. Yamaguchi, H. Satake, N. Fukushima, and A. Toriumi, Appl. Phys. Lett. 80, 1987 (2002).
- (2002) Appl. Phys. Lett. , vol.80 , pp. 1987
- Yamaguchi, T.¹ Satake, H.² Fukushima, N.³ Toriumi, A.⁴

26
- 0037974737
- Y.-S. Lin et al., J. Appl. Phys. 93, 5945 (2003).
- (2003) J. Appl. Phys. , vol.93 , pp. 5945
- Lin, Y.-S.¹

27
- 79956030126
- O. Renault, D. Sartiour, J.-F. Damlencourt, D. Blin, F. Martin, S. Marthon, N. T. Barrett, and P. Besson, Appl. Phys. Lett. 81, 3627 (2002).
- (2002) Appl. Phys. Lett. , vol.81 , pp. 3627
- Renault, O.¹ Sartiour, D.² Damlencourt, J.-F.³ Blin, D.⁴ Martin, F.⁵ Marthon, S.⁶ Barrett, N.T.⁷ Besson, P.⁸

28
- 0037463322
- P. S. Lysaght, B. Foran, G. Bersuker, P. J. Chen, R. W. Murto, and H. R. Huff, Appl. Phys. Lett. 82, 1266 (2003).
- (2003) Appl. Phys. Lett. , vol.82 , pp. 1266
- Lysaght, P.S.¹ Foran, B.² Bersuker, G.³ Chen, P.J.⁴ Murto, R.W.⁵ Huff, H.R.⁶

29
- 0041379612
- S. Stemmer, Z. Chen, C. Levi, P. S. Lysaght, B. Foran, J. A. Gisby, and J. R. Taylor, Jpn. J. Appl. Phys., Part 1 42, 3593 (2003).
- (2003) Jpn. J. Appl. Phys., Part 1 , vol.42 , pp. 3593
- Stemmer, S.¹ Chen, Z.² Levi, C.³ Lysaght, P.S.⁴ Foran, B.⁵ Gisby, J.A.⁶ Taylor, J.R.⁷

30
- 0035978944
- S. S. Kim, Y. Y. Park, and T. H. Sanders, J. Alloys Compd. 321, 84 (2001).
- (2001) J. Alloys Compd. , vol.321 , pp. 84
- Kim, S.S.¹ Park, Y.Y.² Sanders, T.H.³

31
- 0022791128
- V. B. M. Hageman and H. A. J. Oonk, Phys. Chem. Classes 27, 194 (1986).
- (1986) Phys. Chem. Classes , vol.27 , pp. 194
- Hageman, V.B.M.¹ Oonk, H.A.J.²

32
- 0034819173
- C. Veytizou, J. F. Quinson, O. Valfort, and G. Thomas, Solid State Ionics 139, 315 (2001).
- (2001) Solid State Ionics , vol.139 , pp. 315
- Veytizou, C.¹ Quinson, J.F.² Valfort, O.³ Thomas, G.⁴

33
- 0003800429
- Trans Tech Publications
- G. H. Frischat, Ionic Diffusion in Oxide Glasses (Trans Tech Publications, 1975).
- (1975) Ionic Diffusion in Oxide Glasses
- Frischat, G.H.¹

34
- 0028481937
- K. R. Coffey and K. Barmak, Acta Metall. Mater. 42, 2905 (1994).
- (1994) Acta Metall. Mater. , vol.42 , pp. 2905
- Coffey, K.R.¹ Barmak, K.²

35
- 0037429880
- M. Copel, Appl. Phys. Lett. 82, 1580 (2003).
- (2003) Appl. Phys. Lett. , vol.82 , pp. 1580
- Copel, M.¹

36
- 2342577242
- personal communication
- E. Garfunkel (personal communication, 2003).
- (2003)
- Garfunkel, E.¹

37
- 0035472027
- T. Z. Ma et al., IEEE Trans. Electron Devices 48, 2348 (2001).
- (2001) IEEE Trans. Electron Devices , vol.48 , pp. 2348
- Ma, T.Z.¹

38
- 0037175970
- A. Callegari, E. Gousev, T. Zabel, D. Lacey, M. Gribelyuk, and P. Jamison, Appl. Phys. Lett. 81, 4157 (2002).
- (2002) Appl. Phys. Lett. , vol.81 , pp. 4157
- Callegari, A.¹ Gousev, E.² Zabel, T.³ Lacey, D.⁴ Gribelyuk, M.⁵ Jamison, P.⁶

39
- 0032094376
- S. V. Meschel and J. Kleppa, J. Alloys Compd. 274, 193 (1998).
- (1998) J. Alloys Compd. , vol.274 , pp. 193
- Meschel, S.V.¹ Kleppa, J.²

40
- 0036649104
- J. Lettieri, J. H. Haeni, and D. G. Schlom, J. Vac. Sci. Technol. A 20, 1332 (2002).
- (2002) J. Vac. Sci. Technol. A , vol.20 , pp. 1332
- Lettieri, J.¹ Haeni, J.H.² Schlom, D.G.³

41
- 84975349635
- J. Xue, J. Electrochem, Soc. 138, 36C (1991).
- (1991) J. Electrochem, Soc. , vol.138
- Xue, J.¹

42
- 0000739646
- W.-E. Wang and D. R. Olander, J. Am. Ceram. Soc. 76, 1242 (1993).
- (1993) J. Am. Ceram. Soc. , vol.76 , pp. 1242
- Wang, W.-E.¹ Olander, D.R.²

43
- 84977686621
- N. M. Tallan, W. C. Tripp, and R. W. Vest, J. Am. Ceram. Soc. 50, 279 (1967).
- (1967) J. Am. Ceram. Soc. , vol.50 , pp. 279
- Tallan, N.M.¹ Tripp, W.C.² Vest, R.W.³

44
- 0036864637
- I. Kosaki, V. Petrovsky, and H. U. Anderson, J. Am. Ceram. Soc. 85, 2646 (2002).
- (2002) J. Am. Ceram. Soc. , vol.85 , pp. 2646
- Kosaki, I.¹ Petrovsky, V.² Anderson, H.U.³

45
- 2342451388
- Y.-M. Chiang, E. B. Lavik, I. Kosacki, H. L. Tuller, and J. Y. Ying, J. Electroceram, 1, 7 (1997).
- (1997) J. Electroceram , vol.1 , pp. 7
- Chiang, Y.-M.¹ Lavik, E.B.² Kosacki, I.³ Tuller, H.L.⁴ Ying, J.Y.⁵

46
- 0034782493
- C. Zhao, G. Roebben, M. Heyns, and O. V. D. Biest, Key Eng. Mater. 206-2, 1285 (2002).
- (2002) Key Eng. Mater. , vol.206 , Issue.2 , pp. 1285
- Zhao, C.¹ Roebben, G.² Heyns, M.³ Biest, O.V.D.⁴

47
- 0037399773
- X. Wu, D. Landheer, M. J. Graham, H.-W. Chen, T.-Y. Huang, and T.-S. Chao, J. Cryst. Growth 250, 479 (2003).
- (2003) J. Cryst. Growth , vol.250 , pp. 479
- Wu, X.¹ Landheer, D.² Graham, M.J.³ Chen, H.-W.⁴ Huang, T.-Y.⁵ Chao, T.-S.⁶

48
- 33847577894
- R. C. Garvie, J. Phys. Chem. 69, 1238 (1965).
- (1965) J. Phys. Chem. , vol.69 , pp. 1238
- Garvie, R.C.¹

49
- 21544480959
- J. Wang, H. P. Li, and R. Setvens, J. Mater. Sci. 27, 5397 (1992).
- (1992) J. Mater. Sci. , vol.27 , pp. 5397
- Wang, J.¹ Li, H.P.² Setvens, R.³

50
- 0002705225
- S. J. Lee, H. F. Luan, W. P. Bai, C. H. Lee, T. S. Jeon, Y. Senzaki, D. Roberts, and D. L. Kwong, Tech. Dig. - Int. Electron Devices Meet. 2000, 27 (2000).
- (2000) Tech. Dig. - Int. Electron Devices Meet. , vol.2000 , pp. 27
- Lee, S.J.¹ Luan, H.F.² Bai, W.P.³ Lee, C.H.⁴ Jeon, T.S.⁵ Senzaki, Y.⁶ Roberts, D.⁷ Kwong, D.L.⁸

51
- 4244162737
- L. Kang et al., Tech. Dig. - Int. Electron Devices Meet. 2000, 39 (2000).
- (2000) Tech. Dig. - Int. Electron Devices Meet. , vol.2000 , pp. 39
- Kang, L.¹

52
- 79955993048
- D. Niu, R. W. Ashcraft, Z. Chen, S. Stemmer, and G. N. Parsons, Appl. Phys. Lett. 81, 676 (2002).
- (2002) Appl. Phys. Lett. , vol.81 , pp. 676
- Niu, D.¹ Ashcraft, R.W.² Chen, Z.³ Stemmer, S.⁴ Parsons, G.N.⁵

53
- 79956052082
- S. Guha, N. A. Bojarczuk, and V. Narayanan, Appl. Phys. Lett. 80, 766 (2002).
- (2002) Appl. Phys. Lett. , vol.80 , pp. 766
- Guha, S.¹ Bojarczuk, N.A.² Narayanan, V.³

54
- 79956017007
- G. Apostolopoulos, G. Vellianitis, A. Dimoulas, M. Alexe, R. Scholz, M. Fanciulli, D. T. Dekadjevi, and C. Wiemer, Appl. Phys. Lett. 81, 3549 (2002).
- (2002) Appl. Phys. Lett. , vol.81 , pp. 3549
- Apostolopoulos, G.¹ Vellianitis, G.² Dimoulas, A.³ Alexe, M.⁴ Scholz, R.⁵ Fanciulli, M.⁶ Dekadjevi, D.T.⁷ Wiemer, C.⁸

55
- 0035309756
- J. Kwo et al., J. Appl. Phys. 89, 3920 (2001).
- (2001) J. Appl. Phys. , vol.89 , pp. 3920
- Kwo, J.¹

56
- 0040622140
- J. P. Liu, P. Zaumseil, E. Bugiel, and H. J. Osten, Appl. Phys. Lett. 79, 671 (2001).
- (2001) Appl. Phys. Lett. , vol.79 , pp. 671
- Liu, J.P.¹ Zaumseil, P.² Bugiel, E.³ Osten, H.J.⁴

57
- 0035796727
- S. Stemmer, J. P. Maria, and A. I. Kingon, Appl. Phys. Lett. 79, 102 (2001).
- (2001) Appl. Phys. Lett. , vol.79 , pp. 102
- Stemmer, S.¹ Maria, J.P.² Kingon, A.I.³

58
- 0035442443
- O. Fabrichnaya, H. J. Seifert, R. Weiland, T. Ludwig, F. Aldinger, and A. Navrotsky, Z. Metallkd. 92, 1083 (2001).
- (2001) Z. Metallkd. , vol.92 , pp. 1083
- Fabrichnaya, O.¹ Seifert, H.J.² Weiland, R.³ Ludwig, T.⁴ Aldinger, F.⁵ Navrotsky, A.⁶

59
- 0034245968
- Y. Kuroda, H. Hamano, T. Mori, Y. Yoshikawa, and M. Nagao, Langmuir 16, 6937 (2000).
- (2000) Langmuir , vol.16 , pp. 6937
- Kuroda, Y.¹ Hamano, H.² Mori, T.³ Yoshikawa, Y.⁴ Nagao, M.⁵

60
- 79956006479
- D. Niu, R. W. Ashcraft, and G. N. Parsons, Appl. Phys. Lett. 80, 3575 (2002).
- (2002) Appl. Phys. Lett. , vol.80 , pp. 3575
- Niu, D.¹ Ashcraft, R.W.² Parsons, G.N.³

61
- 0004141013
- MacMillan, New York
- K.-N. Tu, J. W. Mayer, and L. C. Feldman, Electronic Thin Film Science for Electrical Engineers and Materials Scientists (MacMillan, New York, 1992).
- (1992) Electronic Thin Film Science for Electrical Engineers and Materials Scientists
- Tu, K.-N.¹ Mayer, J.W.² Feldman, L.C.³

62
- 0030193408
- H. Shin, M. Agarwal, M. R. D. Guire, and A. H. Heuer, J. Am. Ceram. Soc. 79, 1975 (1996).
- (1996) J. Am. Ceram. Soc. , vol.79 , pp. 1975
- Shin, H.¹ Agarwal, M.² Guire, M.R.D.³ Heuer, A.H.⁴

63
- 36549098643
- Y.-T. Cheng, W. L. Johnson, and M.-A. Nicolet, Appl. Phys. Lett. 47, 800 (1985).
- (1985) Appl. Phys. Lett. , vol.47 , pp. 800
- Cheng, Y.-T.¹ Johnson, W.L.² Nicolet, M.-A.³

64
- 0033872011
- J.-C. Zhao, B. P. Bewlay, M. R. Jackson, and Q. Chen, J. Phase Equilib. 21, 40 (2000).
- (2000) J. Phase Equilib. , vol.21 , pp. 40
- Zhao, J.-C.¹ Bewlay, B.P.² Jackson, M.R.³ Chen, Q.⁴

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