Separate and independent control of interfacial band alignments and dielectric constants in transition metal rare earth complex oxides

Microelectronic Engineering

Volumn 72, Issue 1-4, 2004, Pages 288-293

  Lucovsky, G ^a,d   Zhang, Y ^a   Whitten, J L ^a   Schlom, D G ^b   Freeouf, J L ^c  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

^c OREGON HEALTH AND SCIENCE UNIVERSITY   (United States)

^d North Carolina State University   (United States)

Author keywords

Complex mixed oxides; High k dielectrics; Rare earth oxides; Transition metal oxides

Indexed keywords

ABSORPTION SPECTROSCOPY; ELECTRON TUNNELING; ELECTRONIC STRUCTURE; ENERGY GAP; HAFNIUM COMPOUNDS; PERMITTIVITY; THULIUM COMPOUNDS; TITANIUM OXIDES; ZIRCONIA;

COMPLEX MIXED OXIDES; RARE EARTH OXIDES;

GADOLINIUM COMPOUNDS;

EID: 1642603066     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.01.006     Document Type: Conference Paper

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