Thermodynamic stability of high-K dielectric metal oxides ZrO2 and HfO2 in contact with Si and SiO2

Applied Physics Letters

Volumn 80, Issue 11, 2002, Pages 1897-1899

  Gutowski, MacIej ^a,b   Jaffe, John E ^a   Liu, Chun Li ^c   Stoker, Matt ^c   Hegde, Rama I ^d   Rai, Raghaw S ^d   Tobin, Philip J ^d  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF GDA SK   (Poland)

^c MOTOROLA INC   (United States)

^d MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH-K DIELECTRIC; METAL OXIDES; METAL-OXIDE; TRANSMISSION ELECTRON MICROGRAPH; X-RAY PHOTOEMISSION SPECTRA;

DIELECTRIC MATERIALS; HAFNIUM OXIDES; POLYSILICON; SILICATES; SILICIDES; ZIRCONIUM ALLOYS;

THERMODYNAMIC STABILITY;

EID: 79955986464     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1458692     Document Type: Article

References (22)

1. The International Technology Roadmap for Semiconductors, 1999 (Semiconductor Industry Association, San Jose, CA, 1999), pp. 105-141.
2. G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 89, 5243 (2001), and references therein. jap JAPIAU 0021-8979
3. K. J. Hubbard and D. G. Schlom, J. Mater. Res. 11, 2757 (1996), and references therein. jmr JMREEE 0884-2914
4. J. H. Haeni and G. G. Schlom, MRS Bulletin, March 2002 (to be published).
5. F. A. Cotton, G. Wilkinson, C. A. Murillo, and M. Bochmann, Advanced Inorganic Chemistry (Wiley, New York, 2000).
6. G. Kresse and J. Hafner, Phys. Rev. B 47, 558 (1993). prb PRBMDO 0163-1829
7. G. Kresse and J. Hafner, Phys. Rev. B 48, 13115 (1993). prb PRBMDO 0163-1829
8. G. Kresse and J. Fürthmuller, Comput. Mater. Sci. 6, 15 (1996). cmt CMMSEM 0927-0256
9. J. P. Perdew, J. A. Chevary, S. H. Vosko, K. A. Jackson, M. R. Pederson, D. J. Singh, and C. Fiolhais, Phys. Rev. B 46, 6671 (1992). prb PRBMDO 0163-1829
10. H. J. Monkhorst and J. D. Pack, Phys. Rev. B 13, 5188 (1976). prq PLRBAQ 0556-2805
11. D. Vanderbilt, Phys. Rev. B 41, 7892 (1990). prb PRBMDO 0163-1829
12. G. Kresse and J. Hafner, J. Phys.: Condens. Matter 6, 8245 (1994). jcz JCOMEL 0953-8984
13. M. Gutowski et al. (unpublished).
14. J. D. McCullough and K. N. Trueblood, Acta Crystallogr. 12, 507 (1959). acc ACCRA9 0365-110X
15. P. Villars and L. D. Calvert, Pearson's Handbook of Crystallographic Data for Intermetallic Phases (American Society for Metals, Metals Park, OH, 1985), Vol. 3.
16. K. Robinson, G. V. Gibbs, and P. H. Ribbe, Am. Mineral. 56, 782 (1971). amn AMMIAY 0003-004X
17. M. W. Chase, NIST-JANAF Thermochemical Tables, Fourth Edition, J. Phys. Chem. Ref. Data Monograph No. 9 (1998), pp. 1753, 1769, 1789.
18. M. Copel, M. Gribelyuk, and E. Gusev, Appl. Phys. Lett. 76, 436 (2000). apl APPLAB 0003-6951
19. I. Barin, Thermochemical Data of Pure Substances, 3rd ed. (VCH, Wienheim, 1995), Vols. I and II.
20. S. V. Meschel and O. J. Kleppa, J. Alloys Compd. 274, 193 (1998). jal JALCEU 0925-8388
21. S. V. Meschel and O. J. Kleppa, J. Alloys Compd. 280, 231 (1998). jal JALCEU 0925-8388
22. C. Hobbs, L. Dip, K. Reid, D. Gilmer, R. Hegde, T. Ma, B. Taylor, B. Cheng, S. Samavedam, H. Tseng, D. Weddington, F. Huang, D. Farber, M. Schippers, M. Rendon, L. Prabhu, R. Rai, S. Bagchi, J. Conner, S. Backer, F. Dumbuya, J. Locke, D. Workman, and P. Tobin, 2001 International Symposium on VLSI Technology, Systems, and Applications (2001), p. 204.