Some recent developments in the chemical vapour deposition of electroceramic oxides

Journal of Physics D: Applied Physics

Volumn 36, Issue 6, 2003, Pages

  Jones, Anthony C ^a,b   Chalker, Paul R ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b Epichem Oxides Division   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION (ALD);

DECOMPOSITION; DEPOSITION; EVAPORATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR STRUCTURE;

FERROELECTRIC THIN FILMS;

EID: 0037459393     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/36/6/202     Document Type: Review

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