Soft x-ray photoemission studies of the HfO2/SiO2/Si system

Applied Physics Letters

Volumn 80, Issue 12, 2002, Pages 2135-2137

  Sayan, S ^a   Garfunkel, E ^a   Suzer, S ^b  

^a RUTGERS UNIVERSITY   (United States)

^b BILKENT UNIVERSITY   (Turkey)

Author keywords

[No Author keywords available]

Indexed keywords

SOFT X-RAY PHOTOELECTRON SPECTROSCOPY; SOFT X-RAY PHOTOEMISSION; VALENCE-BAND MAXIMUMS; VALENCE-BAND OFFSET;

HAFNIUM OXIDES; SILICON; VALENCE BANDS; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON COMPOUNDS;

EID: 79956054375     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1450049     Document Type: Article

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