Low-temperature plasma processing for Si photovoltaics

Materials Science and Engineering R: Reports

Volumn 78, Issue 1, 2014, Pages 1-29

  Xiao, S Q ^a,b   Xu, S ^a   Ostrikov, K ^c,d  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b JIANGNAN UNIVERSITY   (China)

^c CSIRO   (Australia)

^d UNIVERSITY OF SYDNEY   (Australia)

Author keywords

Hydrogen surface interactions; Low temperature plasma; Plasma cleaning; Plasma diagnostics; Plasma dissociation and deposition; Plasma induced p n junction; Plasma texturing; Si materials and solar cells; Surface passivation

Indexed keywords

CHEMICAL ANALYSIS; DEPOSITION; DISSOCIATION; FILM GROWTH; HETEROJUNCTIONS; PASSIVATION; PHOTOVOLTAIC EFFECTS; PLASMA DEVICES; PLASMA DIAGNOSTICS; PLASMA INTERACTIONS; SILICATES; SILICON NITRIDE; SILICON SOLAR CELLS; SILICON WAFERS; SOLAR CELLS; SOLAR POWER GENERATION; THIN FILM SOLAR CELLS; THIN FILMS;

LOW TEMPERATURE PLASMAS; P-N JUNCTION; PLASMA CLEANING; PLASMA DISSOCIATION; SURFACE INTERACTIONS; SURFACE PASSIVATION;

TEMPERATURE;

EID: 84894619083     PISSN: 0927796X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mser.2014.01.002     Document Type: Review

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