Insights into the high-rate growth of highly crystallized silicon films from inductively coupled plasma of H2-diluted SiH4

Thin Solid Films

Volumn 511-512, Issue , 2006, Pages 265-270

  Kosku, Nihan ^a   Miyazaki, Seiichi ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

High rate deposition; Microcrystalline silicon; Optical emmision spectroscopy; VHF Inductively coupled plasma

Indexed keywords

CRYSTALLINE MATERIALS; DEPOSITION; FILM GROWTH; INDUCTIVELY COUPLED PLASMA; PHOTOCONDUCTIVITY; SILICA; SILICON; SPECTROSCOPIC ANALYSIS;

CRYSTALLINITY; HIGH RATE DEPOSITION; MICROCRYSTALLINE SILICON; OPTICAL EMMISION SPECTROSCOPY;

THIN FILMS;

EID: 33747414614     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.105     Document Type: Article

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