Dry cleaning process of crystalline silicon surface in a-Si:H/c-Si heterojunction for photovoltaic applications

Thin Solid Films

Volumn 403-404, Issue , 2002, Pages 307-311

  Tucci, M ^a   Salurso, E ^a   Roca, F ^a   Palma, F ^b  

^a ENEA CR Portici   (Italy)

^b Department of Electronic Engineering ^*  (Italy)

Author keywords

Amorphous silicon; Capacitance measurements; Dry etching; Heterojunction; Solar cell

Indexed keywords

CAPACITANCE; CRYSTAL DEFECTS; DRY ETCHING; FINITE DIFFERENCE METHOD; INTERFACES (MATERIALS); PHOTOVOLTAIC EFFECTS; SEMICONDUCTING SILICON;

PHOTOVOLTAIC APPLICATIONS; RADIOFREQUENCY (RF) DRY ETCHING;

HETEROJUNCTIONS;

EID: 0036468151     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01645-5     Document Type: Conference Paper

References (6)