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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 2, 2002, Pages 492-498

Comprehensive study of microcrystalline silicon solar cells deposited at high rate using 13.56 MHz plasma-enhanced chemical vapor deposition

(5) Roschek, T a Repmann, T a Muller J a Rech, B a Wagner, H a

a FORSCHUNGSZENTRUM JÜLICH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CRYSTAL MICROSTRUCTURE; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILANES; THERMAL EFFECTS;

MICROCRYSTALLINE SILICON SOLAR CELLS;

SILICON SOLAR CELLS;

EID: 0036495476 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1450585 Document Type: Article

Times cited : (117)

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