Inductively coupled plasma grown semiconductor films for low cost solar cells with improved light-soaking stability

Applied Physics Letters

Volumn 99, Issue 3, 2011, Pages

  Shen, Chang Hong ^a   Shieh, Jia Min ^a,b   Huang, Jung Y ^b   Kuo, Hao Chung ^b   Hsu, Chih Wei ^b   Dai, Bau Tong ^a   Lee, Ching Ting ^c   Pan, Ci Ling ^b,d   Yang, Fu Liang ^a  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^c NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^d NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

A-SI:H; AMORPHOUS SI; DEPOSITION TECHNIQUE; FLEXIBLE SUBSTRATE; HIGH DENSITY PLASMAS; HIGH-DENSITY; LIGHT SOAKING; LOW DEFECT DENSITIES; LOW TEMPERATURES; LOW-COST SOLAR CELLS; REACTIVE RADICALS; SEMICONDUCTOR FILMS; SI FILMS; THIN FILM SOLAR CELLS; THIN-FILM TECHNIQUE;

AMORPHOUS FILMS; AMORPHOUS SILICON; CONVERSION EFFICIENCY; DEFECT DENSITY; INDUCTIVELY COUPLED PLASMA; PLASMA DEPOSITION; SEMICONDUCTING SILICON; SEMICONDUCTOR JUNCTIONS; SILICON;

PLASMA STABILITY;

EID: 79960795964     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3615650     Document Type: Article

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