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Volumn 20, Issue 21, 2009, Pages
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Structural evolution of nanocrystalline silicon thin films synthesized in high-density, low-temperature reactive plasmas
a,b
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS PHASE;
BONDED HYDROGEN;
COLUMNAR STRUCTURES;
CRYSTALLINE FRACTIONS;
DEPOSITED FILMS;
ENVIRONMENTALLY-FRIENDLY;
FILM MICROSTRUCTURES;
FOURIER TRANSFORM INFRARED ABSORPTION SPECTROSCOPY;
GLASS SUBSTRATES;
GROWTH PROCESS;
HIGH GROWTH RATE;
HIGH QUALITY;
HIGH-DENSITY;
HYDROGEN CONTENTS;
HYDROGEN DILUTION;
INDUCTIVELY-COUPLED;
LOW SUBSTRATE TEMPERATURE;
LOW TEMPERATURE SYNTHESIS;
LOW TEMPERATURES;
MEAN-GRAIN SIZE;
NANO-CRYSTALLINE SILICON THIN FILMS;
NANOCRYSTALLINE PHASE;
NANOCRYSTALLINE SI;
NANOCRYSTALLINE SI FILMS;
PLASMA-SURFACE INTERACTIONS;
REACTIVE PLASMAS;
SILANE PRECURSOR;
SILICON THIN FILM;
SINGLE CRYSTAL SILICON;
STRUCTURAL AND OPTICAL PROPERTIES;
STRUCTURAL EVOLUTION;
SUBSTRATE TEMPERATURE;
UV/ VIS SPECTROSCOPY;
VARIABLE CONTENT;
VERTICALLY ALIGNED;
ABSORPTION SPECTROSCOPY;
AMORPHOUS FILMS;
AMORPHOUS SILICON;
AUGER ELECTRON SPECTROSCOPY;
CRYSTALLINE MATERIALS;
ENERGY GAP;
FILM GROWTH;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
HYDROGEN;
INDUCTIVELY COUPLED PLASMA;
INFRARED SPECTROSCOPY;
INTEGRATED OPTOELECTRONICS;
NANOCRYSTALLINE ALLOYS;
NANOCRYSTALLINE SILICON;
OPTICAL BAND GAPS;
OPTICAL MICROSCOPY;
OPTICAL PROPERTIES;
PHOTORESISTS;
PHYSICAL VAPOR DEPOSITION;
PLASMA DEPOSITION;
PLASMA DIAGNOSTICS;
PLASMA INTERACTIONS;
PRASEODYMIUM COMPOUNDS;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
SILANES;
SYNTHESIS (CHEMICAL);
THIN FILMS;
SUBSTRATES;
NANOCRYSTAL;
NANOFILM;
NANOMATERIAL;
SILANE;
SILICON;
ABSORPTION SPECTROSCOPY;
ARTICLE;
CRYSTRAL STRUCTURE;
DENSITY;
DISSOCIATION;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
HYDROGEN BOND;
INFRARED SPECTROSCOPY;
LOW TEMPERATURE;
NANOTECHNOLOGY;
PARTICLE SIZE;
PRIORITY JOURNAL;
RAMAN SPECTROMETRY;
SCANNING ELECTRON MICROSCOPY;
SURFACE PROPERTY;
SYNTHESIS;
TEMPERATURE DEPENDENCE;
TRANSMISSION ELECTRON MICROSCOPY;
ULTRAVIOLET SPECTROSCOPY;
X RAY DIFFRACTION;
ARTIFICIAL MEMBRANE;
CHEMISTRY;
CONFORMATION;
CRYSTALLIZATION;
GAS;
HEAT;
MACROMOLECULE;
MATERIALS TESTING;
METHODOLOGY;
ULTRASTRUCTURE;
CRYSTALLIZATION;
GASES;
HOT TEMPERATURE;
MACROMOLECULAR SUBSTANCES;
MATERIALS TESTING;
MEMBRANES, ARTIFICIAL;
MOLECULAR CONFORMATION;
NANOSTRUCTURES;
NANOTECHNOLOGY;
PARTICLE SIZE;
SILICON;
SURFACE PROPERTIES;
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EID: 67649194469
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/20/21/215606 Document Type: Article |
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Times cited : (75)
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References (32)
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