The growth of microcrystalline silicon oxide thin films studied by in situ plasma diagnostics

Applied Physics Letters

Volumn 102, Issue 5, 2013, Pages

  Kirner, S ^a   Gabriel, O ^a   Stannowski, B ^a   Rech, B ^a   Schlatmann, R ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

A-SI:H; CRYSTALLINITIES; DEPOSITION PROCESS; INTERMEDIATE REFLECTORS; OXYGEN CONTENT; OXYGEN INCORPORATION; PLASMA PROPERTIES; PROCESS GAS; RADIO FREQUENCY POWER; SERIES RESISTANCES; SITU DIAGNOSTICS; TANDEM SOLAR CELLS;

ELECTRIC RESISTANCE; PLASMA DIAGNOSTICS; REFRACTIVE INDEX; SILICON;

SILICON OXIDES;

EID: 84874036189     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4790279     Document Type: Article

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