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Volumn 39, Issue 20, 2006, Pages 4423-4428

Investigation on the initial growth of nanocrystalline silicon prepared from hydrogen-diluted SiCl4 at low temperatures

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SILICON COMPOUNDS; THERMAL EFFECTS; THIN FILMS;

EID: 33749430805     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/39/20/019     Document Type: Article
Times cited : (8)

References (39)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.