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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 37, Issue 9 PART A/B, 1998, Pages

The generation of high-density microwave plasma and its application to large-area microcrystalline silicon thin film formation

(3) Shirai, Hajime a Arai, Takeshi a Ueyama, Hiroyuki b

a SAITAMA UNIVERSITY (Japan)

b Nihon Koshuha Co Ltd (Japan)

Author keywords

High deposition rate; High density plasma; Large area plasma; Low electron temperature; Microwave plasma; SiH2Cl2; Spokewise antenna; c Si:H

Indexed keywords

DEPOSITION; ELECTRONIC DENSITY OF STATES; FILM PREPARATION; HYDROGENATION; LOW TEMPERATURE EFFECTS; MICROWAVE GENERATION; PHOTOCONDUCTIVITY; PLASMA APPLICATIONS; SEMICONDUCTING SILICON; THIN FILMS;

DICHLOROSILANE; HIGH DENSITY MICROWAVE PLASMA; HIGH DEPOSITION RATE; MICROCRYSTALLINE SILICON; SPOKEWISE ANTENNA;

PLASMAS;

EID: 0032155734 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.37.l1078 Document Type: Article

Times cited : (42)

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