Removal efficiency of organic contaminants on Si wafer by dry cleaning using UV/O 3 and ECR plasma

Applied Surface Science

Volumn 206, Issue 1-4, 2003, Pages 355-364

  Choi, K ^a   Ghosh, S ^b   Lim, J ^a   Lee, C M ^a  

^a Inha University   (South Korea)

^b ST XAVIER S COLLEGE   (India)

Author keywords

AFM; ATR FTIR; Dry cleaning; ECR plasma; Organic contaminants; UV O 3

Indexed keywords

ATOMIC FORCE MICROSCOPY; DRY CLEANING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SURFACE ROUGHNESS;

ORGANIC CONTAMINANTS;

SILICON WAFERS;

EID: 0037441189     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01215-1     Document Type: Note

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