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Volumn 7, Issue 3-4, 2010, Pages 1112-1115
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Plasmas for texturing, cleaning, and deposition: Towards a one pump down process for heterojunction solar cells
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Author keywords
[No Author keywords available]
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Indexed keywords
A-SI:H;
EFFECTIVE LIFETIME;
FABRICATION PROCESS;
GAS RATIO;
HETEROJUNCTION SOLAR CELLS;
HIGH EFFICIENCY;
LIGHT-TRAPPING;
LOW COSTS;
LOW TEMPERATURE PLASMA DEPOSITION;
NATIVE OXIDE REMOVAL;
NATIVE OXIDES;
OPTIMIZED CONDITIONS;
PLASMA PROCESS;
REFLECTANCE VALUES;
RF-PECVD;
RF-POWER;
SI SURFACES;
SI WAFER;
SURFACE RECOMBINATION VELOCITIES;
SURFACE REFLECTANCE;
TEXTURED SURFACE;
CHEMICAL VAPOR DEPOSITION;
DEPOSITION;
HETEROJUNCTIONS;
OPEN CIRCUIT VOLTAGE;
PASSIVATION;
PLASMA DEPOSITION;
PLASMAS;
REFLECTION;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON;
SOLAR CELLS;
TEXTURING;
SILICON WAFERS;
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EID: 77952564537
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.200982704 Document Type: Conference Paper |
Times cited : (5)
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References (16)
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