Microcrystalline silicon for large area thin film solar cells

Thin Solid Films

Volumn 427, Issue 1-2, 2003, Pages 157-165

  Rech, B ^a   Roschek, T ^a   Repmann, T ^a   Muller J ^a   Schmitz, R ^a   Appenzeller, W ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

High rate; Microcrystalline silicon; PECVD; Solar cell; Tandem cell; Up scaling

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRODES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON SOLAR CELLS;

TANDEM CELLS;

THIN FILMS;

EID: 0037416712     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01210-5     Document Type: Conference Paper

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