Surface radicals in silane/hydrogen discharges

Journal of Applied Physics

Volumn 105, Issue 1, 2009, Pages

  Horvath, Peter ^a,b,c   Gallagher, Alan ^a,b  

^a University of Colorado   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c WIGNER RESEARCH CENTRE FOR PHYSICS   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PROPERTIES; IMPACT ENERGY; ION FLUXES; MIXED GAS; NEUTRAL RADICAL; RADICAL DENSITIES; RADIO FREQUENCY DISCHARGES; SUBSTRATE SURFACE; THRESHOLD IONIZATION MASS SPECTROMETRY;

HYDROGEN; ION BOMBARDMENT; IONIZATION OF GASES; IONS; MASS SPECTROMETRY; MICROCRYSTALLINE SILICON; SILANES; SURFACE DISCHARGES; VAPORS;

AMORPHOUS SILICON;

EID: 67649798208     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3050331     Document Type: Article

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