Hydrogen plasma etching technique for mono- And multi-crystalline silicon wafers

Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4

Volumn 2, Issue , 2006, Pages 1395-1398

  Dhamrin, M ^a   Ghazali, N H ^a   Jeon, M S ^a   Saitoh, T ^a   Kamisako, K ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; HYDROGEN; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

HYDROGEN FLOW RATES; ROOM TEMPERATURE;

PLASMA ETCHING;

EID: 41749099026     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/WCPEC.2006.279712     Document Type: Conference Paper

References (3)

1. st Photovoltaic Specialist Conference, 2005, pp 979-982.
2. th European Photovoltaic Solar Energy Conference and Exhibition, 2005, pp. 1344-47.
3. th European Photovoltaic Solar Energy Conference and Exhibition, 2005, pp. 1317-20.