The design and application of electron cyclotron resonance discharges

IEEE Transactions on Plasma Science

Volumn 25, Issue 6, 1997, Pages 1196-1221

  Asmussen Jr , Jes ^a   Grotjohn, Timothy A ^a   Mak, Pengun ^a   Perrin, Mark A ^a  

^a Michigan State University   (United States)

Author keywords

Ecr microwave discharges; High density plasma sources; Plasma processing

Indexed keywords

APPROXIMATION THEORY; ELECTRIC DISCHARGES; ELECTRON SOURCES; EPITAXIAL GROWTH; ETCHING; GALLIUM COMPOUNDS; MATHEMATICAL MODELS; MOLECULAR BEAM EPITAXY; OPTICAL DEVICES; PLASMA SOURCES;

PLASMA REACTORS;

ELECTRON CYCLOTRON RESONANCE;

EID: 0031378025     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.650896     Document Type: Article

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