Distributed electron cyclotron resonance plasma: A technology for large area deposition of device-quality a-Si:H at very high rate

Thin Solid Films

Volumn 516, Issue 20, 2008, Pages 6853-6857

  Leempoel, P ^a   Descamps, P ^a   Kervyn de Meerendre T ^a   Charliac, J ^a   Roca i Cabarrocas, P ^b   Bulkin, P ^b   Daineka, D ^b   Dao, T H ^b   Kleider, J P ^c   Gueunier Farret, M E ^c   Longeaud, C ^c  

^a Dow Corning SA Belgium   (Belgium)

^b LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^c CNRS   (France)

Author keywords

Amorphous silicon; Gas flow rate; High deposition rate; Residence time; Sheath potential

Indexed keywords

AMORPHOUS MATERIALS; ANTENNA ACCESSORIES; ARCHITECTURAL DESIGN; ATOMIC LAYER DEPOSITION; CHARGED PARTICLES; COMPUTER NETWORKS; CYCLOTRON RESONANCE; CYCLOTRONS; DEPOSITION RATES; DIRECT ENERGY CONVERSION; ELECTRON CYCLOTRON RESONANCE; ELECTRONS; FLOW RATE; INJECTION (OIL WELLS); MAGNETISM; METROPOLITAN AREA NETWORKS; MICROFLUIDICS; NETWORK PROTOCOLS; PARTICLE ACCELERATORS; PHOTOVOLTAIC CELLS; PLASMA (HUMAN); PLASMA DEPOSITION; PLASMAS; POLYCRYSTALLINE MATERIALS; RESONANCE; RHENIUM; SCALE (DEPOSITS); SILANES; SILICON; SOLAR CELLS; SOLAR ENERGY; SOLAR EQUIPMENT; SPUTTER DEPOSITION; STEEL STRUCTURES; SURFACE DEFECTS; SURFACE POTENTIAL; TECHNOLOGY; THICK FILMS; THIN FILMS; VAPOR DEPOSITION;

(1 1 0) SURFACE; (OTDR) TECHNOLOGY; BAND GAPS; DEPLETION MODES; DEPOSITION TEMPERATURE (TD); DEVICE-QUALITY; DIELECTRIC FUNCTIONS; DISTRIBUTED ELECTRON CYCLOTRON RESONANCE (DECR); FAST DEPOSITION; FILL FACTOR (FF); FLOW RATE RATIOS; GAS RESIDENCE; HIGH RATES; HIGH-DENSITY PLASMA (HDP); HYDROGENATED AMORPHOUS SILICON (A-SI:H); ION ENERGIES; LARGE AREA DEPOSITION; LARGE AREAS; LOW PRESSURE (LP); MAGNETIC CONFINEMENT; MINORITY CARRIER DIFFUSION LENGTH; POINT INJECTION; REACTOR DESIGNS; SHEATH POTENTIAL; SUBSTRATE TEMPERATURE (ST); THIN FILM SOLAR CELLS;

AMORPHOUS SILICON;

EID: 45949093157     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.12.045     Document Type: Article

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