Broadband optical antireflection enhancement by integrating antireflective nanoislands with silicon nanoconical-frustum arrays

Advanced Materials

Volumn 23, Issue 48, 2011, Pages 5796-5800

  Park, Haesung ^a   Shin, Dongheok ^a   Kang, Gumin ^a   Baek, Seunghwa ^a   Kim, Kyoungsik ^a   Padilla, Willie J ^b  

^a Yonsei University   (South Korea)

^b BOSTON COLLEGE   (United States)

Author keywords

lithography; metamaterials; nanostructures; photonic crystals; self assembly

Indexed keywords

ANTI-REFLECTION; ANTIREFLECTIVE; AR COATINGS; GRADED INDEX; INTEGRATION METHOD; NANO SPHERE LITHOGRAPHY; NANO-ISLANDS; QUARTER-WAVELENGTH;

BIOMIMETICS; COATINGS; LITHOGRAPHY; METAMATERIALS; NANOSTRUCTURES; POLYSTYRENES;

PHOTONIC CRYSTALS;

NANOMATERIAL; SILICON;

ARTICLE; CHEMISTRY; EQUIPMENT DESIGN; LIGHT; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; OPTICS; PHOTON; SCANNING ELECTRON MICROSCOPY; SOLAR ENERGY; SUNLIGHT; SURFACE PROPERTY;

EQUIPMENT DESIGN; LIGHT; MATERIALS TESTING; MICROSCOPY, ELECTRON, SCANNING; NANOSTRUCTURES; NANOTECHNOLOGY; OPTICS AND PHOTONICS; PHOTONS; SILICON; SOLAR ENERGY; SUNLIGHT; SURFACE PROPERTIES;

EID: 83755219997     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201103399     Document Type: Article

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