High-quality surface passivation of silicon solar cells in an industrial-type inline plasma silicon nitride deposition system

Progress in Photovoltaics: Research and Applications

Volumn 12, Issue 1, 2004, Pages 21-31

  Moschner, Jens D ^a   Henze, Jürgen ^a   Schmidt, Jan ^a   Hezel, Rudolf ^a  

^a INSTITUTE FOR SOLAR ENERGY RESEARCH HAMELIN ISFH   (Germany)

Author keywords

PECVD; Silicon nitride; Solar cells; Surface passivation

Indexed keywords

CHEMICAL REACTORS; COATING TECHNIQUES; DIFFUSION; FILM PREPARATION; OPTIMIZATION; PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; SURFACE PHENOMENA;

FILM QUALITY; PLASMA SILICON NITRIDE DEPOSITION SYSTEM; SURFACE PASSIVATION;

SILICON SOLAR CELLS;

PHOTOVOLTAIC SYSTEM;

EID: 0842269051     PISSN: 10627995     EISSN: None     Source Type: Journal    
DOI: 10.1002/pip.523     Document Type: Article

References (17)

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