Surface texturing of silicon by hydrogen radicals

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 11, 2005, Pages 7839-7842

  Nagayoshi, Hiroshi ^a   Konno, Keita ^a   Nishimura, Suzuka ^b   Terashima, Kazutaka ^b  

^a TOKYO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b SHONAN INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Etching; Hydrogen radical; Silicon; Solar cell; Spectral reflectance; Texture; Tungsten particle

Indexed keywords

ANISOTROPY; ANTIREFLECTION COATINGS; ETCHING; HYDROGEN; SOLAR CELLS; SURFACE PROPERTIES; TUNGSTEN;

HYDROGEN RADICAL; SPECTRAL PERFORMANCE; TEXTURE;

SILICON;

EID: 31644441864     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.7839     Document Type: Article

References (13)

1. J. Zhao, A. Wang and M. A. Green: Proc. 21st IEEE PVSC, 1991, p. 333.
2. M. A. Green: High Eficiency Solar Cells (Trans Tech, 1987).
3. R. Ludemann, B. Damiani, A. Rohatgi and G. Willeke: Proc. 17th European Photovoltaic Solar Energy Conf., 2001, p. 1327.
4. C. Zechner, G. Willeke and E. Bucher: Proc. 2nd World Conf. & Exhib. Photovoltaic Solar Energy Conversion, 1998, p. 1693.
5. J. Zhao, A. Wang and M. A. Green: Proc. 2nd World Conf. & Exhib. Photovoltaic Solar Energy Conversion, 1998, p. 1681.
6. A. W. Blakers, A. Wang, A. M. Milne, J. Zhao and M. A. Green: Appl. Phys. Lett. 55 (1989) 1363.
7. R. P. Chang, C. C. Chang and S. Darack: J. Vac. Sci. Technol. 20 (1982) 45.
8. H. Nagayoshi, M. Yamaguchi, K. Kamisako, T. Horigome and Y. Taruy: Jpn. J. Appl. Phys. 33 (1994) L621.
9. H. Nagayoshi, Y. Yamamoto and K. Kamisako: Jpn. J. Appl. Phys. 35 (1996) L451.
10. Y. Sun, R. Nishitani and T. Miyasato: Jpn. J. Appl. Phys. 33 (1994) L1117.
11. S. J. Harris and A. M. Weiner: J. Appl. Phys. 74 (1993) 1022.
12. N. Tsuji, T. Akiyama and H. Komiyama: J. Non-Cryst. Solids 198-200 (1996) 1034.
13. S. Meikle, Y. Nakanishi and Y. Hatanaka: Jpn. J. Appl. Phys. 29 (1990) L2130.