Erratum: Antireflective properties of AZO subwavelength gratings patterned by holographic lithography (Appl Phys B (2010) 100 (953-954))

Applied Physics B: Lasers and Optics

Volumn 100, Issue 4, 2010, Pages 953-954

  Leem, J W ^a   Song, Y M ^b   Lee, Y T ^b   Yu, J S ^a  

^a Kyung Hee University   (South Korea)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

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Indexed keywords

EID: 82855169462     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-010-4109-4     Document Type: Erratum

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