Deposition of controllable preferred orientation silicon films on glass by inductively coupled plasma chemical vapor deposition

Journal of Applied Physics

Volumn 103, Issue 4, 2008, Pages

  Li, Junshuai ^a,c   Wang, Jinxiao ^a   Yin, Min ^a   Gao, Pingqi ^a   He, Deyan ^a   Chen, Qiang ^c   Li, Yali ^b   Shirai, Hajime ^b  

^a LANZHOU UNIVERSITY   (China)

^b Tokyo Denki University   (Japan)

^c SAITAMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; INDUCTIVELY COUPLED PLASMA; THIN FILMS;

FILM CRYSTALLINITY; GAS PHASE TRANSPORT PROCESS; PREFERRED ORIENTATION; SILICON FILMS;

SILICON COMPOUNDS;

EID: 40149087199     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2885158     Document Type: Article

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