-
1
-
-
0003545739
-
-
edited by A. Bouchoule (Wiley, New York).
-
Dusty Plasmas, edited by, A. Bouchoule, (Wiley, New York, 1999).
-
(1999)
Dusty Plasmas
-
-
-
2
-
-
21544469810
-
-
10.1063/1.106981
-
L. Boufendi, A. Plain, J. Ph. Blondeau, A. Bouchoule, C. Laure, and M. Toogood, Appl. Phys. Lett. 60, 169 (1992). 10.1063/1.106981
-
(1992)
Appl. Phys. Lett.
, vol.60
, pp. 169
-
-
Boufendi, L.1
Plain, A.2
Ph. Blondeau, J.3
Bouchoule, A.4
Laure, C.5
Toogood, M.6
-
4
-
-
0028462569
-
-
10.1063/1.357120
-
L. Boufendi, J. Hermann, A. Bouchoule, B. Dubreuil, E. Stoffels, W. Stoffels, and M. de Giorgi, J. Appl. Phys. 76, 148 (1994). 10.1063/1.357120
-
(1994)
J. Appl. Phys.
, vol.76
, pp. 148
-
-
Boufendi, L.1
Hermann, J.2
Bouchoule, A.3
Dubreuil, B.4
Stoffels, E.5
Stoffels, W.6
De Giorgi, M.7
-
6
-
-
0001127041
-
-
10.1088/0963-0252/3/3/007
-
Ch. Hollenstein, J.-L. Dorier, J. Dutta, L. Sansonnens, and A. Howling, Plasma Sources Sci. Technol. 3, 278 (1994). 10.1088/0963-0252/3/3/007
-
(1994)
Plasma Sources Sci. Technol.
, vol.3
, pp. 278
-
-
Hollenstein, Ch.1
Dorier, J.-L.2
Dutta, J.3
Sansonnens, L.4
Howling, A.5
-
7
-
-
0001314405
-
-
10.1063/1.363118
-
C. Courteille, Ch. Hollenstein, J.-L. Dorier, E. Bertran, G. Viera, R. Martins, and A. Macarico, J. Appl. Phys. 80, 2069 (1996). 10.1063/1.363118
-
(1996)
J. Appl. Phys.
, vol.80
, pp. 2069
-
-
Courteille, C.1
Hollenstein, Ch.2
Dorier, J.-L.3
Bertran, E.4
Viera, G.5
Martins, R.6
MacArico, A.7
-
8
-
-
5844403482
-
4 high frequency discharges and the effects of particles on deposited films
-
DOI 10.1116/1.580069
-
Y. Watanabe, M. Shiratani, T. Fukuzawa, H. Kawasaki, Y. Ueda, S. Singh, and H. Ohkura, J. Vac. Sci.Technol. A 14 (3), 995 (1996). 10.1116/1.580069 (Pubitemid 126082201)
-
(1996)
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
, vol.14
, Issue.3
, pp. 995-1001
-
-
Watanabe, Y.1
Shiratani, M.2
Fukuzawa, T.3
Kawasaki, H.4
Ueda, Y.5
Singh, S.6
Ohkura, H.7
-
9
-
-
0032179669
-
-
10.1143/JJAP.37.5757
-
H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, and Y. Watanabe, Jpn. J. Appl. Phys. Part 1 37, 5757 (1998). 10.1143/JJAP.37.5757
-
(1998)
Jpn. J. Appl. Phys. Part
, vol.1
, Issue.37
, pp. 5757
-
-
Kawasaki, H.1
Sakamoto, K.2
Maeda, S.3
Fukuzawa, T.4
Shiratani, M.5
Watanabe, Y.6
-
11
-
-
0033157823
-
-
10.1143/JJAP.38.4556
-
Y. Matsuoka, M. Shiratani, T. Fukuzawa, Y. Watanabe, and K-S. Kim, Jpn. J. Appl. Phys. Part 1 38, 4556 (1999). 10.1143/JJAP.38.4556
-
(1999)
Jpn. J. Appl. Phys. Part 1
, vol.38
, pp. 4556
-
-
Matsuoka, Y.1
Shiratani, M.2
Fukuzawa, T.3
Watanabe, Y.4
Kim, K.-S.5
-
12
-
-
0001321929
-
-
10.1063/1.371256
-
T. Fukuzama, S. Kushima, Y. Matsuoka, M. Shiratani, and Y. Watanabe, J. Appl. Phys. 86, 3543 (1999). 10.1063/1.371256
-
(1999)
J. Appl. Phys.
, vol.86
, pp. 3543
-
-
Fukuzama, T.1
Kushima, S.2
Matsuoka, Y.3
Shiratani, M.4
Watanabe, Y.5
-
13
-
-
0039149507
-
-
10.1063/1.1398066
-
G. Viera, S. Huet, E. Bertran, and L. Boufendi, J. Appl. Phys. 90, 4272 (2001). 10.1063/1.1398066
-
(2001)
J. Appl. Phys.
, vol.90
, pp. 4272
-
-
Viera, G.1
Huet, S.2
Bertran, E.3
Boufendi, L.4
-
14
-
-
18744416519
-
Atomic structure of the nanocrystalline Si particles appearing in nanostructured Si thin films produced in low-temperature radiofrequency plasmas
-
DOI 10.1063/1.1506382
-
G. Viera, M. Mikikian, E. Bertran, P. Roca i Cabarrocas, and L. Boufendi, J. Appl. Phys. 92, 4684 (2002). 10.1063/1.1506382 (Pubitemid 35328349)
-
(2002)
Journal of Applied Physics
, vol.92
, Issue.8
, pp. 4684
-
-
Viera, G.1
Mikikian, M.2
Bertran, E.3
Roca I Cabarrocas, P.4
Boufendi, L.5
-
15
-
-
0041323101
-
-
10.1063/1.1591412
-
Z. Shen, T. Kim, U. Kortshagen, P. H. McMurry, and S. A. Campbella, J. Appl. Phys. 94, 2277 (2003). 10.1063/1.1591412
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 2277
-
-
Shen, Z.1
Kim, T.2
Kortshagen, U.3
McMurry, P.H.4
Campbella, S.A.5
-
16
-
-
0242468482
-
-
10.1063/1.1618356
-
I. B. Denysenko, K. Ostrikov, S. Xu, M. Y. Yu, and C. H. Diong, J. Appl. Phys. 94, 6097 (2003). 10.1063/1.1618356
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 6097
-
-
Denysenko, I.B.1
Ostrikov, K.2
Xu, S.3
Yu, M.Y.4
Diong, C.H.5
-
19
-
-
0000846519
-
-
10.1103/PhysRevE.60.887
-
U. Kortshagen and U. Bhandarkar, Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat. Interdiscip. 60, 887 (1999). 10.1103/PhysRevE.60.887
-
(1999)
Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat. Interdiscip.
, vol.60
, pp. 887
-
-
Kortshagen, U.1
Bhandarkar, U.2
-
20
-
-
0034324652
-
Modelling of silicon hydride clustering in a low-pressure silane plasma
-
DOI 10.1088/0022-3727/33/21/311
-
U. Bhandarkar, M. Swihart, S. Girshik, and U. Kortshagen, J. Phys. D: Appl. Phys. 33, 2731 (2000). 10.1088/0022-3727/33/21/311 (Pubitemid 32020616)
-
(2000)
Journal of Physics D: Applied Physics
, vol.33
, Issue.21
, pp. 2731-2746
-
-
Bhandarkar, U.V.1
Swihart, M.T.2
Girshick, S.L.3
Kortshagen, U.R.4
-
22
-
-
37649031252
-
-
K. de Bleecker, A. Bogaerts, R. Gijbels, and W. Goedheer, Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat. Interdiscip. Top. 69, 056409, (2004);
-
(2004)
Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat. Interdiscip. Top.
, vol.69
, pp. 056409
-
-
De Bleecker, K.1
Bogaerts, A.2
Gijbels, R.3
Goedheer, W.4
-
23
-
-
41349113986
-
-
10.1103/PhysRevE.69.056409
-
K. De Bleeker, A. Bogaerts, and W. Goedheer, Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat. Interdiscip. Top. 70, 056407 (2004). 10.1103/PhysRevE.69.056409
-
(2004)
Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat. Interdiscip. Top.
, vol.70
, pp. 056407
-
-
De Bleeker, K.1
Bogaerts, A.2
Goedheer, W.3
-
24
-
-
0001239682
-
-
10.1063/1.361026
-
A. Fridman, L. Boufendi, T. Hbid, B. Potapkin, and A. Bouchoule, J. Appl. Phys. 79, 1303 (1996). 10.1063/1.361026
-
(1996)
J. Appl. Phys.
, vol.79
, pp. 1303
-
-
Fridman, A.1
Boufendi, L.2
Hbid, T.3
Potapkin, B.4
Bouchoule, A.5
-
25
-
-
51149217402
-
Scaling laws for particle growth in plasma reactors
-
DOI 10.1063/1.116485, PII S0003695196034055
-
D. Lemons, R. Keinigs, D. Winske, and M. Jones, Appl. Phys. Lett. 68, 613 (1996). 10.1063/1.116485 (Pubitemid 126683906)
-
(1996)
Applied Physics Letters
, vol.68
, Issue.5
, pp. 613-615
-
-
Lemons, D.S.1
Keinigs, R.K.2
Winske, D.3
Jones, M.E.4
-
26
-
-
0034238651
-
-
10.1103/PhysRevE.62.2690
-
A. Gallagher, Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat. Interdiscip. Top. 62, 2690 (2000). 10.1103/PhysRevE.62.2690
-
(2000)
Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat. Interdiscip. Top.
, vol.62
, pp. 2690
-
-
Gallagher, A.1
-
27
-
-
25844498211
-
Kinetic model for generation and growth of plasma dust nanoparticles
-
DOI 10.1016/j.cplett.2005.07.071, PII S0009261405011036
-
B. Gordiets and E. Bertran, Chem. Phys. Lett. 414, 423 (2005). 10.1016/j.cplett.2005.07.071 (Pubitemid 41393645)
-
(2005)
Chemical Physics Letters
, vol.414
, Issue.4-6
, pp. 423-428
-
-
Gordiets, B.F.1
Bertran, E.2
-
29
-
-
65649104116
-
-
10.1134/S1063784209050119
-
B. Gordiets and E. Bertran, Tech. Phys. 54, 674 (2009). 10.1134/S1063784209050119
-
(2009)
Tech. Phys.
, vol.54
, pp. 674
-
-
Gordiets, B.1
Bertran, E.2
-
31
-
-
4043105192
-
-
10.1063/1.340989
-
M. Kushner, J. Appl. Phys. 63, 2532 (1988). 10.1063/1.340989
-
(1988)
J. Appl. Phys.
, vol.63
, pp. 2532
-
-
Kushner, M.1
-
33
-
-
0001503719
-
-
10.1016/0301-0104(82)85177-X
-
J. Perrin, J. P. M. Schmitt, G. De Rosny, B. Drevillon, J. Huc, and A. Lloret, Chem. Phys. 73, 383 (1982). 10.1016/0301-0104(82)85177-X
-
(1982)
Chem. Phys.
, vol.73
, pp. 383
-
-
Perrin, J.1
Schmitt, J.P.M.2
De Rosny, G.3
Drevillon, B.4
Huc, J.5
Lloret, A.6
-
35
-
-
0000117452
-
-
10.1016/0009-2614(85)80237-2
-
G. Inoue and M. Suzuki, Chem. Phys. Lett. 122, 361 (1985) 10.1016/0009-2614(85)80237-2
-
(1985)
Chem. Phys. Lett.
, vol.122
, pp. 361
-
-
Inoue, G.1
Suzuki, M.2
-
36
-
-
0032398538
-
2 deposition in high density plasma reactors and comparisons of model predictions with experimental measurements
-
DOI 10.1116/1.581096
-
E. Meeks, R. S. Larson, P. Ho, C. Apblett, S. M. Han, E. Edelberg, and E. S. Aydil, J. Vac. Sci. Technol. A 16, 544 (1998). 10.1116/1.581096 (Pubitemid 128046767)
-
(1998)
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
, vol.16
, Issue.2
, pp. 544-563
-
-
Meeks, E.1
Larson, R.S.2
Ho, P.3
Apblett, C.4
Han, S.M.5
Edelberg, E.6
Aydil, E.S.7
|