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Volumn 529, Issue , 2013, Pages 138-142
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Fabrication of antireflective nanostructures for crystalline silicon solar cells by reactive ion etching
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Author keywords
Antireflection; Reactive ion etching (RIE); Reflectivity
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Indexed keywords
ANTI-REFLECTION;
ANTIREFLECTIVE NANOSTRUCTURE;
CRYSTALLINE SILICON SOLAR CELLS;
GAS COMPOSITIONS;
NANO SCALE;
NANO-PYRAMIDS;
NANOSCALE FEATURES;
REACTIVE GAS;
REACTIVE ION;
RF PLASMA;
SOLAR REFLECTIVITIES;
SUBWAVELENGTH ANTIREFLECTION STRUCTURE;
WAVELENGTH RANGES;
FABRICATION;
NANOSTRUCTURES;
POLYSILICON;
REACTIVE ION ETCHING;
SULFUR HEXAFLUORIDE;
REFLECTION;
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EID: 84873734657
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2012.09.047 Document Type: Conference Paper |
Times cited : (8)
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References (20)
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