Effects of substrate temperature on structural properties of undoped silicon thin films

Journal of Applied Physics

Volumn 91, Issue 11, 2002, Pages 9401-9407

  Das, Chandan ^a   Dasgupta, Arup ^a   Saha, S C ^a   Ray, Swati ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATRICES; CRYSTALLINE VOLUME FRACTION; CRYSTALLINITIES; GRAIN SIZE; HYDROGEN GAS; LIGHT EXPOSURE; LOW POWER; MICROCRYSTALLINE FILMS; MONOHYDRIDES; RADIO FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS; SILICON FILMS; SUBSTRATE TEMPERATURE; TRANSITION REGIONS; UNDOPED SILICON;

CHEMICAL VAPOR DEPOSITION; HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SUBSTRATES; THIN FILMS;

AMORPHOUS FILMS;

EID: 0036607883     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1474611     Document Type: Article

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