Low-frequency, high-density, inductively coupled plasma sources: Operation and applications

Physics of Plasmas

Volumn 8, Issue 5 II, 2001, Pages 2549-2557

  Xu, S ^a   Ostrikov, K N ^a,b,c,d   Li, Y ^a   Tsakadze, E L ^a   Jones, I R ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b FLINDERS UNIVERSITY   (Australia)

^c NAGOYA UNIVERSITY   (Japan)

^d NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035335474     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1343887     Document Type: Article

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