High rate growth of microcrystalline silicon at low temperatures

Journal of Non-Crystalline Solids

Volumn 266-269 A, Issue , 2000, Pages 84-89

  Kondo, Michio ^a   Fukawa, Makoto ^a   Guo, Lihui ^a,b   Matsuda, Akihisa ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002252601     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0022-3093(99)00744-9     Document Type: Article

References (9)

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