Thermophoretic control of building units in the plasma-assisted deposition of nanostructured carbon films

Journal of Applied Physics

Volumn 96, Issue 8, 2004, Pages 4421-4428

  Rutkevych, P P ^a   Ostrikov, K ^b   Xu, S ^a   Vladimirov, S V ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ACETYLENE; CARBON; CATALYSIS; ELECTROSTATICS; IONIZATION; MASS SPECTROMETERS; MIXTURES; MOLECULAR STRUCTURE; MONOMERS; NICKEL; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; THERMOPHORESIS;

NANOPARTICLE DYNAMICS; ONE-DIMENSIONAL MODELS; PLASMA-ASSISTED DEPOSITION; POLYMORPHOUS CARBON FILMS;

NANOSTRUCTURED MATERIALS;

EID: 7644231581     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1791761     Document Type: Article

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