|
Volumn 386, Issue 2, 2001, Pages 256-260
|
Optical emission spectroscopy study toward high rate growth of microcrystalline silicon
|
Author keywords
c Si:H; Cathode heating; Electrode distance; Optical emission spectroscopy (OES); RF glow discharge; SiH4
|
Indexed keywords
CATHODES;
CRYSTALLINE MATERIALS;
EMISSION SPECTROSCOPY;
FILM GROWTH;
GLOW DISCHARGES;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RAMAN SPECTROSCOPY;
SILICON;
THIN FILMS;
MICROSCRYSTALLINE SILICON;
OPTICAL EMISSION SPECTROSCOPY (OES);
DIELECTRIC FILMS;
|
EID: 0035874163
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(00)01677-1 Document Type: Article |
Times cited : (55)
|
References (14)
|