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Volumn 386, Issue 2, 2001, Pages 256-260

Optical emission spectroscopy study toward high rate growth of microcrystalline silicon

Author keywords

c Si:H; Cathode heating; Electrode distance; Optical emission spectroscopy (OES); RF glow discharge; SiH4

Indexed keywords

CATHODES; CRYSTALLINE MATERIALS; EMISSION SPECTROSCOPY; FILM GROWTH; GLOW DISCHARGES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILICON; THIN FILMS;

EID: 0035874163     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01677-1     Document Type: Article
Times cited : (55)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.