Silicon on silicon: Self-organized nanotip arrays formed in reactive Ar + H2 plasmas

Nanotechnology

Volumn 21, Issue 2, 2010, Pages

  Levchenko, I ^a,b   Huang, S Y ^c   Ostrikov, K ^a,b   Xu, S ^c  

^a CSIRO   (Australia)

^b UNIVERSITY OF SYDNEY   (Australia)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DISPERSIONS; ELECTRIC DISCHARGES; ETCHING; HYDROGEN; NANOTIPS; PLASMA APPLICATIONS; SILICON; SUBSTRATES; TEMPERATURE;

HYDROGEN TERMINATION; LOW TEMPERATURE FORMATION; NANO-SCALE MATERIALS; NANOSTRUCTURE FORMATION; NUMERICAL CALCULATION; SILICON-ON-SILICON; SUBSTRATE TEMPERATURE; VERTICALLY ALIGNED;

ASPECT RATIO;

ARGON; HYDROGEN; NANOMATERIAL; SILICON;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; GAS; HEAT; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

ARGON; CRYSTALLIZATION; GASES; HOT TEMPERATURE; HYDROGEN; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; SILICON; SURFACE PROPERTIES;

EID: 77449092710     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/2/025605     Document Type: Article

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