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Volumn 91, Issue 9, 2002, Pages 5571-5580

Anion reactions in silane plasma

Author keywords

[No Author keywords available]

Indexed keywords

ANION CHEMISTRY; ELECTRON ATTACHMENT; ELECTRON DECAY; LOW ENERGY ELECTRONS; NEUTRALIZATION RATE; PRIOR ESTIMATES; PULSED DISCHARGE; RADICAL DENSITIES; RADICAL REACTIONS; SILANE PLASMAS; TWO SOURCES;

EID: 0036572620     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1459758     Document Type: Article
Times cited : (46)

References (15)
  • 1
    • 0001768863 scopus 로고    scopus 로고
    • edited by A. Bouchell (Wiley, Chichester, 1999)
    • J. Perrin and Ch. Hollenstein, in Dusty Plasmas, edited by A. Bouchell (Wiley, Chichester, 1999), pp. 77-180.
    • Dusty Plasmas , pp. 77-180
    • Perrin, J.1    Hollenstein, Ch.2
  • 2
    • 0034238651 scopus 로고    scopus 로고
    • pre PLEEE8 1063-651X
    • A. Gallagher, Phys. Rev. E 62, 2690 (2000). pre PLEEE8 1063-651X
    • (2000) Phys. Rev. e , vol.62 , pp. 2690
    • Gallagher, A.1
  • 8
    • 4043105192 scopus 로고
    • jaJAPIAU 0021-8979
    • M. J. Kushner, J. Appl. Phys. 63, 2532 (1988). jap JAPIAU 0021-8979
    • (1988) J. Appl. Phys. , vol.63 , pp. 2532
    • Kushner, M.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.