High pressure regime of plasma enhanced deposition of microcrystalline silicon

Journal of Applied Physics

Volumn 97, Issue 7, 2005, Pages

  Amanatides, E ^a   Hammad, A ^a   Katsia, E ^a   Mataras, D ^a  

^a UNIVERSITY OF PATRAS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION RATE; HYDROGEN DISCHARGE; MICROCRYSTALLINE SILICON; PLASMA ENHANCED DEPOSITION;

CRYSTALLINE MATERIALS; DISSOCIATION; ENERGY DISSIPATION; FLUXES; HIGH PRESSURE EFFECTS; MASS SPECTROMETRY; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

SILICON;

EID: 17544362798     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1866477     Document Type: Article

References (58)

1. N. Wyrch, Proceedings of the 2nd World Conference on Photovoltaic Energy Conversion, edited by, J. Schmidt (European Commission, Ispra, IT, 1998), Vol. I, pp. 467-471.
2. K. Saito, M. Sano, K. Matsuda, T. Kondo, T. Nishimoto, K. Ogawa, and I. Kajita, Proceedings of the 2nd World Conference on Photovoltaic Energy Conversion, edited by, J. Schmidt (European Commission, Ispra, IT, 1998), Vol. I, pp. 351-354.
3. J. Meier, R. Flückiger, H. Keppner, and A. Shah, Appl. Phys. Lett. 65, 860 (1994).
4. K. Yamamoto, M. Yoshimi, T. Suzuki, Y. Tawada, Y. Okamoto, and A. Nakajima, Mater. Res. Soc. Symp. Proc. 507, 131 (1998).
5. R. Schroop and M. Zeman, Amorphous and Microcrystalline Silicon Solar Cells (Kluwer Academic, Dordrecht, 1998).
6. M. Tzolov, F. Finger, R. Carius, and P. Hapke, J. Appl. Phys. 81, 7376 (1997).
7. P. Torres, H. Keppner, J. Meier, U. Kroll, N. Beck, and A. Shah, Phys. Status Solidi A 163, R9 (1997).
8. A. Matsuda, J. Non-Cryst. Solids 338-340, 1 (2004).
9. U. Kroll, J. Meier, A. Shah, S. Mikhailov, and J. J. Weber, J. Appl. Phys. 80, 4971 (1996).
10. E. Amanatides, D. Mataras, and D. E. Rapakoulias, J. Vac. Sci. Technol. A 20, 68 (2002).
11. D. G. Moon, B. H. Jung, J. N. Lee, B. T. Ahn, H. B. Im, K. S. Nam, and S. W. J. Kang, Mater. Sci. 5, 364 (1994).
12. U. Kroll, J. Meier, A. Shah, S. Mikhailov, and J. J. Weber, J. Appl. Phys. 80, 4971 (1996).
13. M. Kondo, M. Fukawa, L. Guo, and A. Matsuda, J. Non-Cryst. Solids 266-269, 84 (2000).
14. H. Curtins, N. Wyrsch, and A. Shah, Electron. Lett. 23, 228 (1987).
15. F. Finger, R. Carius, P. Hapke, L. Houben, M. Luysberg, and M. Tzolov, Mater. Res. Soc. Symp. Proc. 452, 725 (1997).
16. S. Zhang, J. Non-Cryst. Solids 338-340, 530 (2004).
17. C. Summonte, R. Rizzoli, E. Centurioni, D. Iencinella, L. Moretti, L. De Stefano, and I. Rendina, J. Non-Cryst. Solids 338-340, 784 (2004).
18. P. Delli Veneri, L. V. Mercldo, C. Minarini, and C. Privato, Thin Solid Films 451-452, 269 (2004).
19. E. Amanatides, D. Mataras, and D. E. Rapakoulias, J. Appl. Phys. 90, 5799 (2001).
20. U. Graf, J. Meier, U. Kroll, J. Bailat, C. Droz, E. Vallat-Sauvain, and A. Shah, Thin Solid Films 427, 37 (2003).
21. T. Kitajima, Y. Takeo, N. Nakano, and T. Makabe, J. Appl. Phys. 84, 5928 (1998).
22. M. Surenda and D. B. Graves, Appl. Phys. Lett. 59, 2091 (1991).
23. M. Capitelli, C. Gorse, R. Winkler, and J. Wilhelm, Plasma Chem. Plasma Process. 8, 399 (1988).
24. E. Amanatides and D. Mataras, J. Appl. Phys. 89, 1556 (2001).
25. L. Sansonnens, A. A. Howling and Ch. Hollenstein, Plasma Sources Sci. Technol. 7, 115 (1998).
26. L. Guo, M. Kondo, M. Fukawa, K. Saitoh, and A. Matsuda, Jpn. J. Appl. Phys., Part 2 37, L1116 (1998).
27. J. K. Rath, R. H. J. Franken, A. Gordijn, R. E. I. Schropp, and W. J. Goedheer, J. Non-Cryst. Solids 338-340, 56 (2004).
28. M. Tanda, M. Kondo, and A. Matsuda, Thin Solid Films 427, 33 (2003).
29. H. Aguas, P. Roca i Cabarrocas, S. Lebib, V. Silva, E. Fortunato, and R. Martins, Thin Solid Films 427, 6 (2003).
30. S. Suzuki, M. Kondo, and A. Matsuda, Sol. Energy Mater. Sol. Cells 74, 489 (2002).
31. V. Suendo, A. V. Kharchenko, and P. Roca i Cabarrocas, Thin Solid Films 451-452, 259 (2004).
32. Y. Fukuda, Y. Sakuma, C. Fukai, Y. Fujimara, K. Azuma, and H. Shirai, Thin Solid Films 386, 256 (2001).
33. T. Takagi, R. Hayashi, G. Ganguly, M. Kondo, and A. Matsuda, Thin Solid Films 345, 75 (1999).
34. M. Isomura, M. Kondo, and A. Matsuda, Sol. Energy Mater. Sol. Cells 66, 375 (2001).
35. R. W. Collins and A. S. Ferlauto, Curr. Opin. Solid State Mater. Sci. 6, 425 (2002).
36. T. Roschek, T. Repmann, J. Müller, B. Rech, and H. Wagner, J. Vac. Sci. Technol. A 20, 492 (2002).
37. B. Rech, T. Roschek, T. Repmann, J. Muller, R. Schmitz, and W. Appenzeller, Thin Solid Films 427, 157 (2003).
38. N. Spiliopoulos, D. Mataras, and D. E. Rapakoulias, J. Vac. Sci. Technol. A 14, 2757 (1996).
39. N. Spiliopoulos, D. Mataras, and D. E. Rapakoulias, J. Electrochem. Soc. 144, 634 (1997).
40. D. Mataras, S. Cavadias, and D. Rapakoulias, J. Appl. Phys. 66, 119 (1989).
41. E. Amanatides, S. Stamou, S. Boghosian, and D. Mataras, Proceedings of the 16th European Photovoltaic Solar Energy Conference, edited by, H. Scheer, (James & James Ltd., London, 2000), Vol. I, pp. 581-584.
42. E. Katsia, E. Amanatides, D. Mataras, and D. Rapakoulias, Proceedings of the 19th European Photovoltaic Solar Energy Conference, Paris France, 3-7 July 2004, Vol. II, pp. 1601-1604.
43. M. Heintze, R. Zedlitz, and G. H. Bauer, J. Phys. D 26, 1781 (1993).
44. A. A. Howling, J.-L. Dorier, Ch. Hollenstein, U. Kroll, and F. Finger, J. Vac. Sci. Technol. A 10, 1080 (1992).
45. C. Beneking, J. Appl. Phys. 68, 4461 (1990).
46. S. Tsurubuchi, K. Motohashi, S. Matsuoka, and T. Arikawa, Chem. Phys. 161, 493 (1992).
47. F. Tochikubo, T. Makabe, S. Kakuta, and A. Suzuki, J. Appl. Phys. 71, 2143 (1992).
48. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, IEEE Trans. Plasma Sci. 19, 660 (1991).
49. BOLSIG (Shareware), Kinema Software 〈 http://www.siglo-kinema.com/ bolsig.htm 〉
50. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, J. Appl. Phys. 69, 3455 (1991).
51. R. B. Bird, W. E. Stewart, and E. N. Lightfoot, Transport Phenomena (Wiley, New York, 1960).
52. D. M. Himmelblau and K. B. Bischoff, Process Analysis and Simulation: Deterministic Systems (Wiley, New York, 1967).
53. E. Amanatides, S. Stamou, and D. Mataras, J. Appl. Phys. 90, 5786 (2001).
54. E. Katsia, E. Amanatides, D. Mataras, A. Soto, and G. Voyiatzis, Sol. Energy Mater. Sol. Cells (submitted).
55. A. Matsuda and T. Goto, Mater. Res. Soc. Symp. Proc. 164, 3 (1990).
56. J. Perrin, M. Shiratani, P. Kae-Nune, H. Videlot, J. Jolly, and J. Guillon, J. Vac. Sci. Technol. A 16, 278 (1998).
57. J. Abrefah and D. R. Olander, Surf. Sci. 209, 291 (1989).
58. A. Tserepi, J. R. Dunlop, B. Preppernau, and T. A. Miller, J. Vac. Sci. Technol. A 10, 1188 (1992).