Polycrystalline silicon film deposited by ICP-CVD

Solar Energy Materials and Solar Cells

Volumn 69, Issue 2, 2001, Pages 139-145

  Yeon Moon, Byeong ^a   Hyoung Youn, Jae ^b   Hwan Won, Sung ^b   Jang, Jin ^a,b  

^a Kyungwoon University   (South Korea)

^b Kyung Hee University   (South Korea)

Author keywords

ICP CVD; Poly Si; SiH2Cl2

Indexed keywords

CRYSTALLIZATION; MIXTURES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; SILANES; VOLUME FRACTION;

SOLID-PHASE CRYSTALLIZATION;

SILICON SOLAR CELLS;

EID: 0035452846     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(00)00387-1     Document Type: Article

References (8)