Growth mechanism of microcrystalline silicon obtained from reactive plasmas

Thin Solid Films

Volumn 337, Issue 1-2, 1999, Pages 1-6

  Matsuda, Akihisa ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

Microcrystalline silicon; Reactive plasmas

Indexed keywords

EID: 0002139241     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01165-1     Document Type: Article

References (7)

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