Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor

Progress in Photovoltaics: Research and Applications

Volumn 21, Issue 4, 2013, Pages 760-764

  Duttagupta, Shubham ^a   Lin, Fen ^a   Shetty, Kishan Devappa ^a   Aberle, Armin G ^a   Hoex, Bram ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

boron emitter; crystalline silicon; industrial inline PECVD reactor; large area high efficiency Si wafer solar cells; PECVD aluminium oxide; surface passivation

Indexed keywords

ALUMINIUM OXIDE; CRYSTALLINE SILICONS; INDUSTRIAL INLINE PECVD REACTOR; SI WAFER; SURFACE PASSIVATION;

BORON; DEPOSITS; INDUSTRY; OPEN CIRCUIT VOLTAGE; PASSIVATION; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SILICON NITRIDE; SOLAR CELLS;

SILICON WAFERS;

EID: 84878165577     PISSN: 10627995     EISSN: 1099159X     Source Type: Journal    
DOI: 10.1002/pip.1259     Document Type: Article

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