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Volumn 19, Issue 29, 2009, Pages 5134-5140
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Rapid, low-temperature synthesis of nc-Si in high-density, non-equilibrium plasmas: Enabling nanocrystallinity at very low hydrogen dilution
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC HYDROGEN;
COLUMNAR STRUCTURES;
CRYSTALLINE FRACTIONS;
DEPOSITED FILMS;
EFFECT OF HYDROGEN;
FLOWRATE RATIO;
FOURIER TRANSFORM INFRARED ABSORPTION SPECTROSCOPY;
GLASS SUBSTRATES;
GROWTH SURFACES;
HIGH DEPOSITION RATES;
HIGH-DENSITY;
HYDROGEN CONTENTS;
HYDROGEN DILUTION;
HYDROGEN DILUTION RATIO;
HYDROGEN MOLECULE;
INDUCTIVELY-COUPLED;
LOW TEMPERATURE SYNTHESIS;
MEAN-GRAIN SIZE;
NANO-CRYSTALLINE SILICON THIN FILMS;
NANOCRYSTALLINE SILICON FILMS;
NANOCRYSTALLINITY;
NONEQUILIBRIUM PLASMAS;
REACTANT GAS;
REACTIVE SILANES;
SINGLE CRYSTAL SILICON;
STRUCTURAL AND OPTICAL PROPERTIES;
SUBSTRATE TEMPERATURE;
UV/ VIS SPECTROSCOPY;
VERTICALLY ALIGNED;
CRYSTALLINE MATERIALS;
DEPOSITION;
DEPOSITION RATES;
DILUTION;
ELECTROMAGNETIC INDUCTION;
ENERGY GAP;
FOURIER TRANSFORMS;
GAS ABSORPTION;
GRAIN SIZE AND SHAPE;
HYDROGEN;
INDUCTIVELY COUPLED PLASMA;
INFRARED SPECTROSCOPY;
METALLIC FILMS;
NANOCRYSTALLINE SILICON;
OPTICAL BAND GAPS;
OPTICAL PROPERTIES;
PLASMA DEPOSITION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RAMAN SPECTROSCOPY;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
SUBSTRATES;
WAVELET TRANSFORMS;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
ABSORPTION SPECTROSCOPY;
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EID: 70449487129
PISSN: 09599428
EISSN: 13645501
Source Type: Journal
DOI: 10.1039/b904227j Document Type: Article |
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Times cited : (79)
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References (36)
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