Deposition of microcrystalline silicon prepared by hot-wire chemical-vapor deposition: The influence of the deposition parameters on the material properties and solar cell performance

Journal of Applied Physics

Volumn 98, Issue 2, 2005, Pages

  Klein, Stefan ^a   Finger, Friedhelm ^a   Carius, Reinhard ^a   Stutzmann, Martin ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b WALTER SCHOTTKY INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC DEFECTS; MICROCRYSTALLINE SILICON; TANDEM CELLS; WAVELENGTHS;

ABSORPTION; CATALYSIS; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; DEPOSITION; DIFFUSION; ELECTRONIC PROPERTIES; HEAT RADIATION; PASSIVATION; SOLAR CELLS; THIN FILMS;

SILICON;

EID: 23844507299     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1957128     Document Type: Article

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