Nanopowder management and control of plasma parameters in electronegative SiH4 plasmas

Journal of Applied Physics

Volumn 94, Issue 9, 2003, Pages 6097-6107

  Denysenko, I B ^a,f   Ostrikov, K ^a,b,c   Xu, S ^a   Yu, M Y ^d   Diong, C H ^e  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF SYDNEY   (Australia)

^c FLINDERS UNIVERSITY   (Australia)

^d RUHR UNIVERSITY BOCHUM   (Germany)

^e NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^f V N KARAZIN KHARKIV NATIONAL UNIVERSITY   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

NATURAL GAS; PLASMA DENSITY; PLASMAS; SILICON; SILICON COMPOUNDS; ULTRAVIOLET RADIATION;

NANOPOWDER MANAGEMENT; PLASMA PARAMETERS;

NANOSTRUCTURED MATERIALS;

EID: 0242468482     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1618356     Document Type: Article

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